Wafer holder method and apparatus in a vacuum deposition system

Details Wafer holder method and apparatus in a vacuum deposition system Wafer holder method and apparatus in a vacuum deposition system

1989-09-13

1991-07-09

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

118500, C23C 1400

Patent

active

050295551

ABSTRACT:
A method and apparatus for maintaining orientation of a wafer with respect to the wafer holder and a source emission is disclosed.
Briefly stated, a wafer is disposed on a wafer holder and displaced in translation only while made to continuously follow a planar closed path which allows the rotation of the wafer with respect to source of emission while keeping the wafer and the wafer holder uniformly aligned with respect to each other.

REFERENCES:
patent: 3598083 (1971-08-01), Dort
patent: 3783822 (1974-01-01), Wollam
patent: 3853091 (1974-12-01), Christensen
patent: 4284033 (1981-08-01), del Rio
patent: 4777908 (1988-10-01), Temple
IBM TDB vol. 21, No. 6, Nov. 1978, pp. 2419-2420, Planetary Rotation Etching Wheel.
IBM TDB vol. 29, No. 4, Sep. 1986, pp. 1805-1806, Planetary Motion Fixture Plate for Thin Film Deposition.
IBM TDB vol. 16, No. 9, Feb. 1974, pp. 2865-2868, Planetary Evaporation System Having Multiple Rotations.

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