Wafer height correction system for focused beam system

Details Wafer height correction system for focused beam system Wafer height correction system for focused beam system

1983-06-17

1985-07-30

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

2504401, G21K 510

Patent

active

045324263

ABSTRACT:
Base plate 32 of the wafer support is flexibly mounted with respect to the floor 34 of the target chamber. Flanges 54 and 58 flex by operation of motor 68 to adjust the position of the wafer support with respect to the focal point of the column.

REFERENCES:
patent: 3388251 (1968-06-01), Grasenick et al.
patent: 3649738 (1972-03-01), Anderson
patent: 3678270 (1972-07-01), Braun et al.
patent: 4425507 (1984-01-01), Panov et al.

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