Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Reexamination Certificate
2005-06-28
2011-12-06
Robinson, Daniel L (Department: 3742)
Electric heating
Heating devices
Combined with container, enclosure, or support for material...
C118S725000
Reexamination Certificate
active
08071916
ABSTRACT:
A wafer heating apparatus which is capable of quickly cooling by improving the cooling rate of the heater section is provided.The wafer heating apparatus comprises a plate-shaped member having two opposing principal surfaces with one of the principal surfaces serving as a mounting surface to mount a wafer thereon and the other principal surface having a band-shaped resistive heating member formed thereon, power feeder terminals connected to the resistive heating member for supplying electric power to the resistive heating member, a casing provided to cover the power feeder terminals on the other surface of the plate-shaped member and a nozzle of which tip faces the other surface of the plate-shaped member for cooling the plate-shaped member, wherein the position of the tip of the nozzle as projected onto the other surface of the plate-shaped member is located between the bands of the resistive heating member.
REFERENCES:
patent: 5643483 (1997-07-01), Kubota et al.
patent: 6179924 (2001-01-01), Zhao et al.
patent: 6433318 (2002-08-01), Danko
patent: 6500266 (2002-12-01), Ho et al.
patent: 6534750 (2003-03-01), Tanoue et al.
patent: 6815647 (2004-11-01), Tanoue et al.
patent: 6897414 (2005-05-01), Ito et al.
patent: 7417206 (2008-08-01), Nakamura
patent: 2002/0190054 (2002-12-01), Ito et al.
patent: 2006/0289448 (2006-12-01), Natsuhara et al.
patent: 58016590 (1983-01-01), None
patent: 07280462 (1995-10-01), None
patent: 08082920 (1996-03-01), None
patent: 10-284382 (1998-10-01), None
patent: 2001-135684 (2001-05-01), None
patent: 2001-168022 (2001-06-01), None
patent: 2001-203156 (2001-07-01), None
patent: 2001-297857 (2001-10-01), None
patent: 2001-297858 (2001-10-01), None
patent: 2001-313249 (2001-11-01), None
patent: 2001351970 (2001-12-01), None
patent: 2002-064133 (2002-02-01), None
patent: 2002-076102 (2002-03-01), None
patent: 2002-083848 (2002-03-01), None
patent: 2002-100462 (2002-04-01), None
patent: 2002100460 (2002-04-01), None
patent: 2002-246159 (2002-08-01), None
patent: 2002-373846 (2002-12-01), None
patent: 2003-100818 (2003-04-01), None
patent: 2003347177 (2003-12-01), None
patent: 2004022475 (2004-01-01), None
patent: 2004031593 (2004-01-01), None
patent: 2004-063813 (2004-02-01), None
patent: 0203434 (2002-01-01), None
Japanese language office action dated Apr. 11, 2008 and its English language translation for corresponding Japanese application 2004189545 lists the references above.
Japanese language office action dated Apr. 16, 2008 and its English language translation for corresponding Japanese application 2004189545 lists the references above.
Iwata Keiji
Nagasaki Koichi
Nakamura Tsunehiko
DLA Piper (LLP) US
Kyocera Corporation
Robinson Daniel L
LandOfFree
Wafer heating apparatus and semiconductor manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wafer heating apparatus and semiconductor manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer heating apparatus and semiconductor manufacturing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4305222