Wafer heating apparatus and semiconductor manufacturing...

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

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C118S725000

Reexamination Certificate

active

08071916

ABSTRACT:
A wafer heating apparatus which is capable of quickly cooling by improving the cooling rate of the heater section is provided.The wafer heating apparatus comprises a plate-shaped member having two opposing principal surfaces with one of the principal surfaces serving as a mounting surface to mount a wafer thereon and the other principal surface having a band-shaped resistive heating member formed thereon, power feeder terminals connected to the resistive heating member for supplying electric power to the resistive heating member, a casing provided to cover the power feeder terminals on the other surface of the plate-shaped member and a nozzle of which tip faces the other surface of the plate-shaped member for cooling the plate-shaped member, wherein the position of the tip of the nozzle as projected onto the other surface of the plate-shaped member is located between the bands of the resistive heating member.

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Japanese language office action dated Apr. 16, 2008 and its English language translation for corresponding Japanese application 2004189545 lists the references above.

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