Coating apparatus – Gas or vapor deposition – Work support
Patent
1998-05-04
2000-04-25
Font, Frank G.
Coating apparatus
Gas or vapor deposition
Work support
4147448, 414751, C23C 1600, B66C 2300, B65G 2300
Patent
active
060539836
ABSTRACT:
A plurality of projections 21 is disposed on a inner surface of a lid 20 which is detachably attached to a carrier body 10. Each projection 21 has a tapered end part 22 with inclined surfaces 23, 24. The surfaces 23, 24 are in the form of semitransparent mirror. A Light emitting device 47 projects light beam which travels horizontally to the projection 21 from outside of the lid 20. When a wafer is not present in slots 15 of the carrier body, the light beam travels to upper and lower adjacent photoelectric devices 48, 48 via the upper and lower adjacent projections 21. The semitransparent mirror 23, 24 changes the light beam traveling direction. When the wafer is present in the slots 15, the light beam is intercepted by the wafer, and the photoelectric devices 48 does not receive the light beam. In aforementioned manner, whether a wafer is present or not in the slots 15 can be detected.
REFERENCES:
patent: 4875824 (1989-10-01), Moe et al.
patent: 4971512 (1990-11-01), Lee et al.
patent: 5133635 (1992-07-01), Malin et al.
patent: 5792304 (1998-08-01), Tamura et al.
patent: 5810935 (1998-09-01), Lee et al.
Asakawa Teruo
Saeki Hiroaki
Font Frank G.
Punnoose Roy M.
Tokyo Electron Ltd.
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