Wafer electrical discharge control by wafer lifter system

Details Wafer electrical discharge control by wafer lifter system Wafer electrical discharge control by wafer lifter system

1996-12-19

1999-05-18

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118728, 118729, 156345, C23C16/00

Patent

active

059047798

ABSTRACT:
A substrate lifting arrangement for use in a plasma processing chamber. The plasma processing chamber has a chuck configured for supporting a substrate during processing of the substrate within the plasma processing chamber. The substrate lilting arrangement includes at least one substrate engaging element movable between a first position in which the substrate engaging element does not engage the substrate and a second position in which the substrate engaging element engages the substrate and lifts the substrate off the chuck. The substrate lifting arrangement further includes an actuator coupled to the substrate engaging element. The actuator controls movement of the substrate engaging element between the first and second positions. There is firer included a resistance arrangement coupled to the substrate engaging element. The resistance arrangement limits a current flowing from the substrate to ground through the resistance arrangement. The current is caused by remaining electrical charges on the substrate when the substrate is lifted off the chuck by the substrate engaging element.

REFERENCES:
patent: 5463525 (1995-10-01), Barnes et al.
patent: 5467249 (1995-11-01), Barnes et al.
patent: 5535507 (1996-07-01), Barnes et al.
patent: 5557215 (1996-09-01), Saeki et al.
patent: 5561585 (1996-10-01), Barnes et al.

Affiliated with

Also associated with

Rating

Wafer electrical discharge control by wafer lifter system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer electrical discharge control by wafer lifter system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer electrical discharge control by wafer lifter system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1757545