Wafer drying apparatus and fire-extinguishing method therefor

Details Wafer drying apparatus and fire-extinguishing method therefor Wafer drying apparatus and fire-extinguishing method therefor

1994-02-16

1995-07-11

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

34544, 68209, 134113, 134902, 202170, 203DIG7, B08B 1300, F26B 2500

Patent

active

054311799

ABSTRACT:
A wafer drying apparatus incorporated in a semiconductor wafer cleaning system includes a bath for storing IPA. A heater for generating an IPA vapor is arranged on the bath. The bath is surrounded by a housing. The housing has opening portions at three positions. The opening portions are opened/closed by shutters. A sensor for detecting a fire and a nozzle for discharging CO.sub.2 gas into the bath are arranged around the bath. A plurality of wafers are held by a chuck of a convey robot and are conveyed from the outside of the housing into the housing via the opening portions. When a fire is detected by the sensor, the chuck immediately retreats from the housing, and the shutters are closed. Signals for closing the shutters are transmitted to shutter drive sources again 10 seconds after the fire is detected, and discharging of CO.sub.2 gas is started 20 seconds after the fire is detected.

REFERENCES:
patent: 3580261 (1971-05-01), Key
patent: 4262430 (1981-04-01), Janson et al.
patent: 4736758 (1988-04-01), Kusuhara
patent: 4995172 (1991-02-01), Friedrichs
patent: 5197203 (1993-03-01), Lenoir
patent: 5201958 (1993-04-01), Breunsbach et al.
patent: 5240018 (1993-08-01), Clark et al.
patent: 5273060 (1993-12-01), Hill, III et al.
patent: 5275184 (1994-01-01), Nishizawa et al.
patent: 5299584 (1994-04-01), Miyazaki et al.

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