Cleaning and liquid contact with solids – Apparatus – For work having hollows or passages
Reexamination Certificate
2005-08-09
2005-08-09
Stinnson, Frankie L (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
For work having hollows or passages
C134S171000, C134S902000
Reexamination Certificate
active
06926017
ABSTRACT:
The present invention is directed to a semi-conductor handling equipment cleaning apparatus configured for use with wafer carriers. The base of the cleaning apparatus is configured to support the wafer carrier in sealing contact about a first aperture. A first fluidic circuit is provided for introducing a first cleaning fluid to the inner surface of the carrier. A second fluidic circuit is provided for introducing a second cleaning fluid to the outer surface of the carrier. The carrier forms a barrier with the base so that the cleaning media is isolated so as to substantially prevent the second fluid used to clean the exterior from communicating with the first fluid used to clean the interior of the carrier.
REFERENCES:
patent: 1661602 (1928-03-01), Dary
patent: 1799525 (1931-04-01), Morgan
patent: 2788008 (1957-04-01), Wanzer
patent: 3073325 (1963-01-01), Rebizzo et al.
patent: 3092120 (1963-06-01), Hilger et al.
patent: 3734109 (1973-05-01), Hebner
patent: 4015615 (1977-04-01), Weber et al.
patent: 4133340 (1979-01-01), Ballard
patent: RE31203 (1983-04-01), Jackson
patent: 4381016 (1983-04-01), Douglas et al.
patent: 4437479 (1984-03-01), Bardina et al.
patent: 4785836 (1988-11-01), Yamamoto
patent: 4941489 (1990-07-01), Kamimura et al.
patent: 4957129 (1990-09-01), Kraft et al.
patent: 4983548 (1991-01-01), Uno et al.
patent: 5224503 (1993-07-01), Thompson et al.
patent: 5238503 (1993-08-01), Phenix et al.
patent: 5286302 (1994-02-01), Wickhamm, III
patent: 5301700 (1994-04-01), Kamikawa et al.
patent: 5313965 (1994-05-01), Palen
patent: 5363867 (1994-11-01), Kawano et al.
patent: 5409545 (1995-04-01), Levey et al.
patent: 5522410 (1996-06-01), Meilleur
patent: 5562113 (1996-10-01), Thompson
patent: 5603342 (1997-02-01), Shambaugh
patent: 5616208 (1997-04-01), Lee
patent: 5715851 (1998-02-01), Jung et al.
patent: 5738128 (1998-04-01), Thompson et al.
patent: 5972127 (1999-10-01), Thompson et al.
patent: 5991965 (1999-11-01), Stroh et al.
patent: 6216710 (2001-04-01), White et al.
patent: 6267123 (2001-07-01), Yoshikawa et al.
patent: 6276373 (2001-08-01), Gotfried
patent: 6322633 (2001-11-01), Bexten et al.
patent: 53136358 (1978-11-01), None
patent: 06134411 (1994-05-01), None
Entegris, Inc.
Patterson Thuente, Skaar & Christensen, PA
Perrin Joseph L
Stinnson Frankie L
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