Brushing – scrubbing – and general cleaning – Machines – Wiping
Patent
1997-11-18
1999-08-10
Spisich, Mark
Brushing, scrubbing, and general cleaning
Machines
Wiping
15 971, B08B 104, B08B 300, B08B 1100
Patent
active
059339020
ABSTRACT:
A wafer cleaning and drying apparatus comprises a vertical wafer drive assembly, providing two-sided wafer cleaning by symmetrically disposed brushes. Each wafer brush comprises two parallel rotatable shafts within the lumen of a substantially tubular sponge, with an adjustable distance between the two shafts, which is narrowed to facilitate insertion into the sponge and widened to stretch the sponge into a substantially oval cross-sectional shape, thereby improving traction. One or more nonrotating perforated fluid delivery tubes are mounted within the lumen of the sponge in the space between the two shafts. The apparatus further comprises a minimal volume rinse/dry enclosure that conserves water and process chemicals; and a wafer transport assembly configured to transfer multiple wafers simultaneously between multiple process stations.
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Jerald A. Britten, "A moving-zone Marangoni drying process for critical cleaning and wet processing," Solid State Technology, Oct. 1997, pp. 143-148.
YieldUP, Omega 2000, YieldUP International, 117 Easy Street, Mountain View, California USA 94043, Bulletin No. D0013-6/96E, (2 pages).
Spisich Mark
Steuber David E.
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