Wafer cleaning device for use in manufacturing a semiconductor d

Details Wafer cleaning device for use in manufacturing a semiconductor d Wafer cleaning device for use in manufacturing a semiconductor d

1989-02-03

1990-12-04

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134134, 134161, 414226, B08B 304

Patent

active

049746197

ABSTRACT:
There is disclosed a cleaning device for cleaning a semiconductor wafer. According to the present invention, ech of the steps of the cleaning process used a separate carrier, so that none but the wafers need be washed, saving washing time. When drying, the surfaces of the wafers are kept from being contaminated by residual cleansers, thereby improving the yield rate.

REFERENCES:
patent: 1866124 (1932-07-01), Oertli
patent: 2375630 (1945-05-01), Davis
patent: 3082675 (1963-03-01), Sousa et al.
patent: 3106925 (1963-10-01), Rand
patent: 3152685 (1964-10-01), Heck
patent: 3276983 (1966-10-01), Dolan et al.

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