Wafer cleaning apparatus with rotating cleaning solution injecti

Details Wafer cleaning apparatus with rotating cleaning solution injecti Wafer cleaning apparatus with rotating cleaning solution injecti

1996-12-18

1999-05-11

Stinson, Frankie L.

Cleaning and liquid contact with solids

Processes

Work handled in bulk or groups

134180, 134186, 134902, 239242, B08B3/02

Patent

active

059017163

ABSTRACT:
A wafer cleaning apparatus includes at least one nozzle fixing tube disposed in a wall of a cleaning bath. A plurality of injection nozzles are arranged on the nozzle fixing tube for spraying a compressed cleaning solution toward the wafer. A rotating device rotates the at least one nozzle fixing tube and the plurality of injection nozzles within a predetermined angle.

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patent: 3178117 (1965-04-01), Hanifan
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patent: 4753258 (1988-06-01), Seiichiro
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patent: 5069235 (1991-12-01), Vetter et al.
patent: 5378308 (1995-01-01), Thoms
patent: 5437296 (1995-08-01), Citino
patent: 5520205 (1996-05-01), Guldi et al.
patent: 5547247 (1996-08-01), Kakatani et al.
patent: 5657927 (1997-08-01), Bushman et al.

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