Wafer cleaning apparatus with probe cleaning and methods of...

Details Wafer cleaning apparatus with probe cleaning and methods of... Wafer cleaning apparatus with probe cleaning and methods of...

2008-06-03

2008-06-03

Perrin, Joseph L. (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S196000, C134S201000, C134S902000

Reexamination Certificate

active

07380560

ABSTRACT:
Wafer cleaning apparatus include a cleaning tub configured to receive a wafer to be cleaned. A wafer cleaning unit coupled to the cleaning tub is configured to provide wafer cleaning solution to the wafer. A probe is positioned in the cleaning tub proximate the wafer. The probe is configured to provide megasonic vibrational energy to a surface of the wafer and/or the wafer cleaning solution to separate contaminants from the surface of the wafer. A probe cleaning unit is configured to provide a probe cleaning solution to the probe to clean the probe. Methods of using the wafer cleaning apparatus are also provided.

REFERENCES:
patent: 6039059 (2000-03-01), Bran
patent: 6140744 (2000-10-01), Bran
patent: 6843257 (2005-01-01), Yeo et al.
patent: 2002/0185152 (2002-12-01), Lauerhaas et al.
patent: 2003-48763 (2000-07-01), None
patent: 2002-0071249 (2002-09-01), None
patent: 2003-0014590 (2003-02-01), None

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