Wafer cleaning apparatus with anticipating malfunction of pump

Details Wafer cleaning apparatus with anticipating malfunction of pump Wafer cleaning apparatus with anticipating malfunction of pump

2004-04-29

2008-10-14

Perrin, Joseph L (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With alarm, signal, indicating, testing, inspecting,...

C134S186000, C134S902000

Reexamination Certificate

active

07434589

ABSTRACT:
Apparatus for and a method of cleaning or processing a wafer anticipates a malfunction of a pump and avoids an abrupt shutting down of the pump during the cleaning or processing of the wafer. The apparatus includes a tank vessel containing a liquid used in the cleaning or processing of the wafer, a pump that pumps the liquid chemical from the vessel, a filter that filters impurities contained in the liquid pumped by the pump, a heater that heats the filtered liquid to a predetermined temperature and supplies the heated liquid back into the tank vessel, and a pump malfunction anticipation unit that operates at the same time as the pump. The pump malfunction anticipation unit calculates the flow rate of the liquid pumped by the pump using a program, and based on the flow rate anticipates when it is time to replace the pump.

REFERENCES:
patent: 5968268 (1999-10-01), Kitano et al.
patent: 6158966 (2000-12-01), Guespin et al.
patent: 6318386 (2001-11-01), Kamikawa et al.
patent: 6328814 (2001-12-01), Fishkin et al.
patent: 1999-009960 (1999-03-01), None
patent: 20-0292098 (1999-05-01), None
patent: 100247907 (1999-12-01), None

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