Brushing – scrubbing – and general cleaning – Machines – Wiping
Patent
1996-07-15
1999-03-02
Till, Terrence
Brushing, scrubbing, and general cleaning
Machines
Wiping
15 77, 15 883, A47L 2500
Patent
active
058755071
ABSTRACT:
An apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During use, a wafer is orientated vertically between the first and second brushes. The brushes are brought into contact with the wafer and rotated thereby engaging the wafer with rollers. By rotating the rollers, the wafer is also rotated. Liquid is sprayed towards the brushes and wafer. By orienting the wafer vertically, liquid and particulates contained therein readily fall from the wafer due to gravity. This is particularly advantageous when cleaning larger diameter wafers in which particulates must be removed from a larger wafer surface area.
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Jones Oliver David
Miller, III Hugo John
Stephens Donald Edgar
Hodgson Serge J.
Oliver Design, Inc.
Steuber David E.
Till Terrence
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