Abrading – Machine – Combined
Reexamination Certificate
2006-05-30
2006-05-30
Nguyen, Dung Van (Department: 3723)
Abrading
Machine
Combined
C451S288000, C451S444000
Reexamination Certificate
active
07052376
ABSTRACT:
A wafer carrier gap washer includes at least one wafer carrier head and at least one nozzle installed on a wafer load/unload mechanism. The wafer carrier head has a flexible membrane and a retaining ring for holding a wafer beneath the wafer carrier head during a CMP process. The nozzle sprays fluid toward a gap between the flexible membrane and the retaining ring so as to wash the gap and remove slurry residues produced in the CMP process.
REFERENCES:
patent: 6319105 (2001-11-01), Togawa et al.
patent: 6325698 (2001-12-01), Wada et al.
patent: 6334810 (2002-01-01), Song et al.
patent: 6402598 (2002-06-01), Ahn et al.
patent: 6443826 (2002-09-01), Yang et al.
Kao Ming-Hsing
Lin Chin-Kun
Tan Wee-Shiong
Teng Ching-Wen
Nguyen Dung Van
United Microelectronics Corp.
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