Wafer carrier gap washer

Abrading – Machine – Combined

Reexamination Certificate

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C451S288000, C451S444000

Reexamination Certificate

active

07052376

ABSTRACT:
A wafer carrier gap washer includes at least one wafer carrier head and at least one nozzle installed on a wafer load/unload mechanism. The wafer carrier head has a flexible membrane and a retaining ring for holding a wafer beneath the wafer carrier head during a CMP process. The nozzle sprays fluid toward a gap between the flexible membrane and the retaining ring so as to wash the gap and remove slurry residues produced in the CMP process.

REFERENCES:
patent: 6319105 (2001-11-01), Togawa et al.
patent: 6325698 (2001-12-01), Wada et al.
patent: 6334810 (2002-01-01), Song et al.
patent: 6402598 (2002-06-01), Ahn et al.
patent: 6443826 (2002-09-01), Yang et al.

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