Coating apparatus – Gas or vapor deposition – Work support
Patent
1993-12-28
1995-05-23
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Work support
118500, 206454, 211 41, H01L 2102, B05C 1302
Patent
active
054177677
ABSTRACT:
A wafer carrier which supports at least one wafer, during a process in which material is deposited on the wafer from chemical vapor in a reactor, includes a base having an inner curved surface extending from a first lateral edge of the base to a second lateral edge of the base. Slots in the inner surface of the base extending generally continuously from the first lateral edge to the second lateral edge are defined by a bottom wall and opposing side walls. The slots may each receive at least a portion of a thin, outwardly facing edge of the wafer for holding the wafer in an upright position. The bottom wall of the slot closely conforms to the predetermined shape of the portion of the outwardly facing peripheral edge of the wafer to inhibit the entry of vapor between the base and the outwardly facing edge of the wafer and the formation of material bridges between the wafer and the carrier by deposition of the material from the chemical vapor.
REFERENCES:
patent: 4355974 (1982-10-01), Lee
patent: 4466381 (1984-08-01), Jenkins
patent: 4548159 (1985-10-01), Foster
patent: 4572101 (1986-02-01), Lee
patent: 4586743 (1986-05-01), Edwards
patent: 4676008 (1987-06-01), Armstrong
patent: 4694778 (1987-09-01), Learn
patent: 4920920 (1990-05-01), Shigeki
patent: 4981222 (1991-01-01), Lee
patent: 5054418 (1991-10-01), Thompson
patent: 5292393 (1994-03-01), Maydan
Breneman R. Bruce
Lund Jeffrie R.
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