Wafer burn-in test and wafer test circuit

Static information storage and retrieval – Read/write circuit – Testing

Reexamination Certificate

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Details

C365S225700, C365S189020, C365S189050

Reexamination Certificate

active

06711077

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a wafer burn-in test and a wafer test circuit for a semiconductor memory device using a probe pad for contact, and in particular to a wafer burn-in test and a wafer test circuit which can cut down packaging expenses and improve F/T yield by performing a wafer burn-in test by using a pad for contact in a probe test of a wafer state.
2. Description of the Background Art
In general, a screening test is performed to identify a DRAM having a defect at an early stage. The screening test mostly employs a burn-in test mode (a high temperature high voltage operation test). The burn-in test operation exposes a potential defect in the DRAM in a short time by operating the DRAM in the worst conditions such as at a high temperature and a high voltage. In the burn-in test operation, an appropriate stress voltage, especially an accelerating stress voltage, is applied to the respective units of the chip to detect the defect.
The burn-in test operation is used not only for the DRAM but also for the other semiconductor memory devices. An internal power circuit for generating an internal power voltage Vint to the DRAM adjusts the internal voltage so that an internal circuit cannot receive an excessive stress voltage in the burn-in test operation, and thus applies only a stress voltage for screening thereto.
Generally, actual contact with the semiconductor memory device using a probe pad for contact is performed after a probe test of a wafer state and before packaging. Accordingly, when an inferior chip is not sufficiently screened in the probe test, if a defect occurs after packaging, the chip cannot be repaired. In order to solve the foregoing problem, the wafer burn-in test is executed in the wafer state before packaging.
FIG. 1
is a block diagram illustrating a conventional wafer burn-in test circuit including a first probe pad unit
1
for contact, a second probe pad unit
2
for contact, a first buffer unit
3
, a second buffer unit
4
, a decoder unit
5
, a data multiplexer unit
6
, a test mode block unit
7
and an array control unit
8
.
The first buffer unit
3
converts a signal BOP
0
IN inputted through the first probe pad unit
1
for contact into a CMOS level, and the second buffer unit
4
converts a signal BOP
1
IN inputted through the second probe pad unit
2
for contact into a CMOS level.
The decoder unit
5
receives the signals BOP
0
and BOP
1
from the first and second buffer units
3
and
4
, and generates a control signal BPX<0:1>. The data multiplexer unit
6
inputs/outputs a desired data bit based on the control signal BPX<0:1> from the decoder unit
5
.
The test mode block unit
7
generates a control signal TBIN<0:1> in the wafer burn-in test mode. The array control unit
8
controls bit lines, word lines and plate lines making up an access transistor (not shown) of a memory cell based on the control signal TBIN<0:1> from the test mode block unit
7
, thereby applying a stress voltage to the cell, bit line and storage node.
FIG. 2
is a circuit diagram illustrating the first buffer unit
3
of FIG.
1
. The first buffer unit
3
includes: a PMOS transistor MP
1
for transmitting a power voltage VDD to a node Nd
1
based on a power-up signal PUPB; a PMOS transistor MP
2
for transmitting the power voltage VDD to the node Nd
1
based on an initialization signal IDL; a PMOS transistor MP
3
for transmitting the power voltage VDD to the node Nd
1
based on a ground voltage VSS; a PMOS transistor MP
4
for transmitting the signal of the node Nd
1
to a node Nd
2
transmitting the signal BOP
0
IN from the first probe pad unit
1
based on the ground voltage VSS; an inverter IV
2
for receiving the signal of the node Nd
2
, and outputting an inverted signal to a node Nd
3
; a PMOS transistor MP
5
for transmitting the power voltage VDD to the node Nd
2
based on the signal of the node Nd
3
; and an inverter IV
3
for receiving the signal of the node Nd
3
, and outputting an inverted signal BOP
0
.
When the power-up signal PUPB has a high state, the power voltage VDD is supplied to the node Nd
1
through the PMOS transistors MP
1
and MP
3
, and the signal of the node Nd
1
is transmitted to the node Nd
2
through the PMOS transistor MP
4
. Therefore, the signal BOP
0
IN of the node Nd
2
has a high state during the power-up operation, and the output signal BOP
0
has a high state. That is, the first buffer unit
3
maintains the initial state during non-contact by the first probe pad unit
1
.
The second buffer unit
4
of
FIG. 1
has the same constitution and operation as the first buffer unit
3
of FIG.
2
. Accordingly, the input signal BOP
1
IN of the second buffer unit
4
has a high state during the power-up operation, and the output signal BOP
1
has a high state. Identically, the second buffer unit
4
serves to maintain the initial state during non-contact by the second probe pad unit
2
.
FIG. 3
is a circuit diagram illustrating the decoder unit
5
of FIG.
1
. The decoder unit
5
includes: an inverter IV
10
for receiving the output signal BOP
0
from the first buffer unit
3
, and outputting an inverted signal; an inverter IV
20
for receiving the output signal BOP
1
from the second buffer unit
4
, and outputting an inverted signal; an inverter IV
30
for receiving the output signal from the inverter IV
20
, and outputting an inverted signal; a NAND gate ND for receiving the output signals from the inverters IV
10
and IV
20
; inverters IV
50
and IV
60
connected in series, between an output node Nd
30
of the NAND gate ND and a node Nd
40
transmitting a control signal BPX
8
; a NOR gate NR for receiving the output signal from the NAND gate ND and the output signal from the inverter IV
20
, and outputting a control signal BPX
4
; and an inverter IV
40
connected between an output node Nd
20
of the inverter IV
30
and a node Nd
50
transmitting a control signal BPX
16
.
When the input signal BOP
0
from the first buffer unit
3
and the input signal BOP
1
from the second buffer unit
4
have a low state, the output signal BPX
8
has a high state, the output signal BPX
4
has a low state, and the output signal BPX
16
has a high state. When the input signal BOP
0
and the input signal BOP
1
have a high state, the output signal BPX
8
has a high state, the output signal BPX
4
has a low state, and the output signal BPX
16
has a low state. When the input signal BOP
0
has a low state and the input signal BOP
1
has a high state, the output signal BPX
8
, the output signal BPX
4
and the output signal BPX
16
have a low state. When the input signal BOP
0
has a high state and the input signal BOP
1
has a low state, the output signal BPX
8
has a high state, the output signal BPX
4
has a low state, and the output signal BPX
16
has a high state.
The data multiplexer unit
6
controls input/output of a desired data bit based on the output signal BPX<0:1> from the decoder unit
5
.
However, the conventional wafer burn-in test circuit has a disadvantage in that, although the number of prober pins for the wafer burn-in test is reduced in using the probe pad for the wafer burn-in test, the chip area is increased due to the probe pad. Moreover, since address information is required for the wafer burn-in test in the test mode using an address key, the number of the prober pins for the test is increased, thereby increasing the prober production cost and the setting time before the test.
SUMMARY OF THE INVENTION
Accordingly, it is an object of the present invention to provide a wafer burn-in test and a wafer test circuit which can cut down packaging expenses, improve F/T yield and reduce the production cost, by screening an inferior chip before packaging by executing a wafer burn-in test with a fuse and a probe pad for contact prior to the contact.
In order to achieve the above-described object of the invention, there is provided a wafer test circuit including: a buffer unit for initializing an input signal inputted through a probe pad unit h

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