Wafer boat for vertical diffusion and vapor growth furnace

Coating apparatus – Work holders – or handling devices

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Details

118728, 118724, 432241, C23C 1600

Patent

active

057797978

ABSTRACT:
A wafer boat having a structure for supporting a plurality of wafers one above another at an interval. The structure includes a plurality of support posts disposed upright and essentially perpendicular to principal surfaces of the wafers at positions around the wafers, and a plurality of supporting bars each of which extends laterally from each of the support posts and supports a wafer back at positions thereof spaced apart from a center of the wafer by a distance corresponding to two-thirds of the radius of the wafer. The wafers may be (001)-wafers, and the supporting bars may support the wafer back at positions thereof corresponding to of the stress generated due to the weight of the wafer.

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Reif, Understanding Basic Mechanics, John Wiley & Sons, Inc., pp. 181-183, 1995.
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Wolf,S> et al, Silicon Processing for the VLSI Era, vol. 1, Process Technology, Lattice Press, pp. 1-5, 1986.

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