Wafer boat for supporting silicon wafers

Coating apparatus – Gas or vapor deposition – Work support

Patent

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Details

206454, 211 41, 29 2501, C23C 1600, B65D 8548

Patent

active

054682975

ABSTRACT:
A boat, for vertically holding semiconductor wafers, includes a cradle in the shape of a hollow half cylinder with a horizontal axis; two grooved plates, disposed against the interior lateral walls of the cradle accommodating the semiconductor wafers to be treated, the two plates being independent and abutting against the cradle without being fastened thereto; and a horizontal plate maintaining a distance between the two lateral grooved plates and serving as a removable guide during the loading operation of the semiconductor wafers.

REFERENCES:
patent: 3826377 (1974-06-01), Bachmann
patent: 3828726 (1974-08-01), Dietze
patent: 3834349 (1974-09-01), Dietze
patent: 4093201 (1978-06-01), Dietze
patent: 4484538 (1984-11-01), Sarkozy
patent: 4548159 (1985-10-01), Foster
patent: 4569452 (1986-02-01), Schulke
patent: 4676008 (1987-06-01), Armstrong
patent: 4841906 (1989-06-01), deGeest, Jr.
patent: 4987016 (1991-01-01), Ohto

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