Wafer bevel edge cleaning system and apparatus

Details Wafer bevel edge cleaning system and apparatus Wafer bevel edge cleaning system and apparatus

2005-06-28

2005-06-28

Warden, Sr., Robert J. (Department: 1744)

Brushing, scrubbing, and general cleaning

Machines

Brushing

C015S102000, C015S088200

Reexamination Certificate

active

06910240

ABSTRACT:
A system, method and apparatus for cleaning a substrate edge includes a substrate supporting device for substantially supporting a substrate in a selected plane. The substrate has a circular shape, a circumferential edge, a front side and a back side. The edge has a bevel shaped cross-section. The substrate edge cleaning apparatus also includes a first edge cleaning roller that has an open curved scrubbing surface in contact with at least part of a first portion the edge of the substrate. An interaction of the first edge cleaning roller with the part of the first portion can also be adjusted dynamically.

REFERENCES:
patent: 5725414 (1998-03-01), Moinpour et al.
patent: 5729856 (1998-03-01), Jang et al.
patent: 5861066 (1999-01-01), Moinpour et al.
patent: 6092253 (2000-07-01), Moinpour et al.
patent: 6230753 (2001-05-01), Jones et al.
patent: 6550091 (2003-04-01), Radman et al.
patent: 2004/0049870 (2004-03-01), Tolles et al.

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