Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent
1996-10-18
1998-11-03
Breneman, R. Bruce
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
438692, 216 88, 156345LP, 451 41, 451287, 451398, H01L 21302
Patent
active
058308067
ABSTRACT:
A wafer backing member for use in a wafer carrier of a chemical-mechanical planarization machine between the wafer carrier and the backside of a semiconductor wafer or other substrate. In one embodiment, the backing member has a body including a first layer to abut against the backside of the wafer and a second layer to abut against the wafer carrier. The first layer is substantially rigid or substantially non-compressible to preferably inhibit flexing of the wafer, and the second layer is resiliently compressible to cushion the backside of the wafer. In operation, the compressible second layer reduces the differences in pressure from one area of the wafer to another and the rigid first layer distributes the forces more uniformly across the backside of the wafer. As a result, the wafer backing member substantially reduces the center-to-edge difference in polishing rates to more uniformly planarize the front face of the wafer.
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Hudson Guy F.
Robinson Karl M.
Alanko Anita
Breneman R. Bruce
Micro)n Technology, Inc.
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