Wafer alignment method for dual beam system

Details Wafer alignment method for dual beam system Wafer alignment method for dual beam system

2008-01-29

2008-01-29

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C250S306000, C250S307000, C250S309000

Reexamination Certificate

active

07323697

ABSTRACT:
A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion46having a mark47for aligning visual field alignment positioned in advance to the same horizontal and the same height as a stage plane as a reference point is arranged on a wafer holder. A height of an observation point on a sample is adjusted to the height of the mark47and the visual field of a gradient column is brought into conformity with the visual field of a vertical column by use of a known offset between the gradient column and the vertical column at that time.

REFERENCES:
patent: 6039000 (2000-03-01), Libby et al.
patent: 7009192 (2006-03-01), Suzuki et al.
patent: 2006/0219953 (2006-10-01), Carleson
patent: 2002-503870 (2002-02-01), None
patent: WO 99/41765 (1999-08-01), None

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