VUV laser beam characterization system

Radiant energy – Invisible radiant energy responsive electric signalling – Ultraviolet light responsive means

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C372S029011

Reexamination Certificate

active

06624424

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates to a beam characterization system, and particularly to an apparatus for monitoring VUV excimer and molecular fluorine laser beam parameters.
2. Discussion of the Related Art
It is recognized herein that there are additional considerations to designing a vacuum ultraviolet (VUV) beam characterization system than for conventional beam characterization, e.g., for deep ultraviolet (DUV) lasers such as the KrF excimer laser and for other lasers having wavelengths above 200 nm. First, conventional CCD cameras tend to degrade in performance when a VUV beam is incident on the camera. Second, the beam path for a VUV beam will be filled with VUV photoabsorbing species unless extra measures are taken to prepare the beam path so that the beam can reach the detector without substantial attenuation by these VUV absorbing species. It is therefore desired to have a system for VUV beam characterization or diagnosis without substantial detector degradation or beam attenuation that would otherwise occur if conventional 200 nm+systems were used for characterizing the VUV beam. It is also desired to have a compact and efficient beam characterization system.
SUMMARY OF THE INVENTION
In accordance with the above, a beam characterization monitoring apparatus is provided for receiving an input VUV beam and measuring a beam profile characteristic of the beam. An enclosure has an interior substantially free of VUV photoabsorbing species and configured for receiving the input VUV beam. A beam splitter separates the input VUV beam into a first component for measuring a near field beam profile characteristic and a second component for measuring a far field beam profile characteristic. A detector is coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species and detects at least one of the first component and the second component.
Further in accordance with the above, a beam characterization monitoring apparatus is provided for receiving an input VUV beam and measuring a beam profile characteristic of the beam. An enclosure has an interior substantially free of VUV photoabsorbing species and configured for receiving the input VUV beam. A detector is coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species and detects a beam profile characteristic of the input VUV beam. A quantum converter is disposed along the beam path before the detector for converting the VUV beam into a beam having a wavelength above 240 nm.
Further in accord with the above, a beam characterization monitoring apparatus is provided for receiving an input VUV beam and measuring a beam profile characteristic of the beam. An enclosure has an interior substantially free of VUV photoabsorbing species and configured for receiving the input VUV beam. A beam splitter separates the input VUV beam into a first component for measuring a beam profile characteristic and a second component for measuring an energy characteristic of the input VUV beam. A first detector is coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species and detects the first component. A second detector is coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species and detects the second component.
Further in accord with the above object, a beam characterization monitoring apparatus is provided for receiving an input VUV beam and measuring a beam profile characteristic of the beam. An enclosure has an interior substantially free of VUV photoabsorbing species and configured for receiving the input VUV beam. A detector is coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species and detects a far field beam profile of the input VUV beam. A focusing lens focuses the far field beam profile of the VUV input beam to the detector for measuring a far field beam profile characteristic of the VUV input beam.
Further in accord with the above object, a beam characterization monitoring apparatus is provided for receiving an input VUV beam and measuring a beam profile characteristic of the beam. An enclosure has an interior substantially free of VUV photoabsorbing species and configured for receiving the input VUV beam. A detector is coupled with the enclosure via a beam path substantially free of VUV photoabsorbing species and detects a near field beam profile of the input VUV beam.


REFERENCES:
patent: 4707836 (1987-11-01), Travis
patent: 5872626 (1999-02-01), Lipscomb
patent: 6002697 (1999-12-01), Govorkov et al.
patent: 6014206 (2000-01-01), Basting et al.
patent: 6020723 (2000-02-01), Desor et al.
patent: 40 09 826 (1991-10-01), None
K. Mann, et al., “Monitoring and Shaping of Excimer Laser Beam Profiles,”Proceedings of OE Technology, Boston, MA(USA)SPIE, vol. 1834, 1992, pp. 184-194.
H.S. Albrecht, et al., “Measurement and Evaluation Methods for Beam Characterization of Commerical Excimer Lasers,”Proceedings of 3rdInternational Workshop on Laser Beam and Optics Characterization(LBOC)Quebec, Canada, SPIE,vol. 2870, Jul. 1996, pp. 354-359.
S. Bollanti, et al., “Beam Quality Characterization and Times-Diffraction-Limit Estimation of Two-High-Power Excimer Lasers,”Proceedings of 3rdInternational Workshop on Laser Beam and Optics Characterization(LBOC)Quebec, Canada, SPIE, vol. 2870, Jul. 1996, pp. 360-366.
K. Mann, et al., “Characterization of Excimer Laser beam Parameters,”Proceedings of 3rdInternational Workshop on Laser Beam and Optics Characterization(LBOC)Quebec, Canada, SPIE,vol. 2870, Jul. 1996, pp. 367-377.
H.S. Albrecht, et al., Single Pulse Diagnosis of Energy Distributions on Excimer Lasers with High Repetition Rates,Proceedings of 4thInternational Workshop on Laser Beam and Optics Characterization(LBOC), Jun. 1997, pp. 287-297.
ISO Publication No.: 11670: Laser and laser-related equipment—Test methods for laser beam parameters—Beam positional stability,ISO/FDIS 11670,1999, 8 pages.
ISO Publication No.: 11146: Lasers and laser-related equipment—Test methods for laser beam parameters—Beam widths, divergence angle and beam propagation factor, 1999, 32 pages.
ISO Publication No.: 13694: Optics and optical instruments—Lasers and laser-related equipment—Test methods for laser beam power [energy] density distribution, 2000, 22 pages.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

VUV laser beam characterization system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with VUV laser beam characterization system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and VUV laser beam characterization system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3099970

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.