Visible light-sensitive compositions and pattern formation proce

Details Visible light-sensitive compositions and pattern formation proce Visible light-sensitive compositions and pattern formation proce

1998-09-03

2000-09-26

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302701, 430325, 430926, G03F 7004

Patent

active

06124077&

ABSTRACT:
An excellently thermostable visible light-sensitive composition comprising (A) a polymer having carboxyl group(s) or a polymer having carboxyl group(s) and hydroxyphenyl group(s), or (A') a polymer having carboxyl group(s) and (A") a polymer having hydroxyphenyl group(s); (B) a compound having at least two vinyl ether groups per molecule, (C) a compound, which generates an acid when irradiated with a visible light; and (D) a sensitizing dye, and a process for pattern formation using such a composition are disclosed.

REFERENCES:
patent: 4877719 (1989-10-01), Higashi et al.
patent: 5364738 (1994-11-01), Kondo et al.
patent: 5496678 (1996-03-01), Imai et al.
patent: 5679495 (1997-10-01), Yamachika et al.
patent: 5738974 (1998-04-01), Nagasaka et al.

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