Virtual semiconductor nanowire, and methods of using same

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Reexamination Certificate

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C438S048000, C438S049000, C438S197000, C438S199000, C438S154000, C438S290000, C438S285000, C422S050000, C422S068100, C422S083000, C422S098000, C422S082020

Reexamination Certificate

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08007727

ABSTRACT:
A multiple-gate field-effect transistor includes a fluid in a top gate, two lateral gates, and a bottom gate. The multiple-gate field-effect transistor also includes a patterned depletion zone and a virtual depletion zone that has a lesser width than the patterned depletion zone. The virtual depletion zone width creates a virtual semiconductor nanowire that is lesser in width than the patterned depletion zone.

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