Via construction for structural support

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – For high frequency device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S774000, C257S773000, C257S737000, C257S738000, C257S734000, C257S778000, C257S724000, C257S725000, C257S691000, C257S698000, C257S207000, C257S208000, C257S211000

Reexamination Certificate

active

06943446

ABSTRACT:
An integrated circuit having electrically conductive vias with a diameter of between about one micron and about fifty microns. Prior art vias have a diameter of between no less than 0.3 microns to no more than 0.8 microns. In this manner, stresses such as those that press down upon the top surface of the integrated circuit can be absorbed by the large vias and transferred past fragile layers, such as low k layers, so that the fragile layers are not damaged by the stresses.

REFERENCES:
patent: 5483421 (1996-01-01), Gedney et al.
patent: 5710071 (1998-01-01), Beddingfield et al.
patent: 6708404 (2004-03-01), Gaku et al.
patent: 6734542 (2004-05-01), Nakatani et al.
patent: 2002/0113309 (2002-08-01), Fazelpour
patent: 2002/0180062 (2002-12-01), Hsieh et al.
patent: 2002/0195662 (2002-12-01), Eden et al.
patent: 2003/0034566 (2003-02-01), Jimarez et al.
patent: 2003/0043035 (2003-03-01), Flaherty
patent: 2004/0084781 (2004-05-01), Ahn et al.
patent: 2004/0099441 (2004-05-01), Ichiryu et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Via construction for structural support does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Via construction for structural support, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Via construction for structural support will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3382081

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.