Vesicular recording materials

Details Vesicular recording materials Vesicular recording materials

1981-01-19

1982-07-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Processing feature prior to imaging

430152, 430168, 430169, 430290, 430935, G03C 176

Patent

active

043418627

ABSTRACT:
Process for the production of vesicular recording materials. The photographic characteristics such as speed and contrast of vesicular recording materials are improved by treating the light-sensitive vesicular recording layer with an aqueous medium at 5.degree. to 30.degree. C. for at least 45 minutes. The treatment may be effected by spraying with cold water and winding the wet material into a roll. Water marking in the wound roll can be avoided by coating the recording layer prior to water treatment with an antimarking composition such as a solution of nitrocellulose.

REFERENCES:
patent: 3149971 (1964-09-01), Baril et al.
patent: 3684547 (1972-08-01), Bunas et al.
patent: 3841874 (1974-10-01), Nishino

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