Coherent light generators – Particular active media – Gas
Reexamination Certificate
2006-06-13
2006-06-13
Harvey, Min Sun Oh (Department: 2828)
Coherent light generators
Particular active media
Gas
C372S055000, C372S058000, C372S059000, C372S060000
Reexamination Certificate
active
07061961
ABSTRACT:
An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.
REFERENCES:
patent: 4223279 (1980-09-01), Bradford, Jr. et al.
patent: 4455658 (1984-06-01), Sutter et al.
patent: 4550408 (1985-10-01), Karning et al.
patent: 4891820 (1990-01-01), Rando et al.
patent: 4959840 (1990-09-01), Akins et al.
patent: 5005180 (1991-04-01), Edelman et al.
patent: 5023884 (1991-06-01), Akins et al.
patent: 5025445 (1991-06-01), Anderson et al.
patent: 5025446 (1991-06-01), Kuizenga
patent: 5189678 (1993-02-01), Ball et al.
patent: 5313481 (1994-05-01), Cook et al.
patent: 5315611 (1994-05-01), Ball et al.
patent: 5359620 (1994-10-01), Akins
patent: 5448580 (1995-09-01), Birx et al.
patent: 5471965 (1995-12-01), Kapich
patent: 5852621 (1998-12-01), Sandstrom
patent: 5953360 (1999-09-01), Vitruk et al.
patent: 5978394 (1999-11-01), Newman et al.
patent: 6005879 (1999-12-01), Sandstrom et al.
patent: 6016325 (2000-01-01), Ness et al.
patent: 6018537 (2000-01-01), Hofmann et al.
patent: 6028880 (2000-02-01), Carlesi et al.
patent: 6067311 (2000-05-01), Morton et al.
patent: 6094448 (2000-07-01), Fomenkov et al.
patent: 6104735 (2000-08-01), Webb
patent: 6128323 (2000-10-01), Myers et al.
patent: 6151349 (2000-11-01), Gong et al.
patent: 6164116 (2000-12-01), Rice et al.
patent: 6192064 (2001-02-01), Algots et al.
patent: 6208674 (2001-03-01), Webb et al.
patent: 6208675 (2001-03-01), Webb
patent: 6219368 (2001-04-01), Govorkov
patent: 6240117 (2001-05-01), Gong et al.
patent: 6370174 (2002-04-01), Onkels et al.
patent: 6414979 (2002-07-01), Ujazdowski et al.
patent: 6442181 (2002-08-01), Oliver et al.
patent: 6466602 (2002-10-01), Fleurov et al.
patent: 6477193 (2002-11-01), Oliver et al.
patent: 6529531 (2003-03-01), Everage et al.
patent: 6532247 (2003-03-01), Spangler et al.
patent: 6535531 (2003-03-01), Smith et al.
patent: 6538737 (2003-03-01), Sandstrom et al.
patent: 6549551 (2003-04-01), Ness et al.
patent: 6567450 (2003-05-01), Myers et al.
patent: 6584132 (2003-06-01), Morton
patent: 6621846 (2003-09-01), Sandstrom et al.
patent: 6625191 (2003-09-01), Knowles et al.
patent: 6671294 (2003-12-01), Kroyan et al.
patent: 6757316 (2004-06-01), Newman et al.
patent: 6795474 (2004-09-01), Partlo et al.
patent: 2002/0114370 (2002-08-01), Onkels et al.
patent: 2004/0047385 (2004-03-01), Knowles et al.
Anderson Stuart L.
Besaucele Herve A.
Brown Daniel J. W.
Das Palash P.
Ershov Alexander I.
Cray William
Cymer Inc.
Flores-Ruiz Delma R.
Harvey Min Sun Oh
LandOfFree
Very narrow band, two chamber, high rep-rate gas discharge... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Very narrow band, two chamber, high rep-rate gas discharge..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Very narrow band, two chamber, high rep-rate gas discharge... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3628082