Very-high aperture projection objective

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S754000

Reexamination Certificate

active

11528379

ABSTRACT:
A very-high aperture, purely refractive projection objective is designed as a two-belly system with an object-side belly, an image-side belly and a waist (7) situated therebetween. The system diaphragm (5) is seated in the image-side belly at a spacing in front of the image plane. Arranged between the waist and the system diaphragm in the region of divergent radiation is a negative group (LG5) which has an effective curvature with a concave side pointing towards the image plane. The system is distinguished by a high numerical aperture, low chromatic aberrations and compact, material-saving design.

REFERENCES:
patent: 4506958 (1985-03-01), Imai
patent: 5059006 (1991-10-01), Kikuchi et al.
patent: 5260832 (1993-11-01), Togino et al.
patent: 5398064 (1995-03-01), Saka
patent: 5414561 (1995-05-01), Wakimoto et al.
patent: 5623365 (1997-04-01), Kuba
patent: 5636000 (1997-06-01), Ushida et al.
patent: 5696631 (1997-12-01), Hoffman
patent: 5856884 (1999-01-01), Mercado
patent: 5969803 (1999-10-01), Mercado
patent: 5986824 (1999-11-01), Mercado
patent: 6008884 (1999-12-01), Yamaguchi et al.
patent: 6097537 (2000-08-01), Takahashi et al.
patent: 6349005 (2002-02-01), Schuster et al.
patent: 6556353 (2003-04-01), Omura
patent: 6560031 (2003-05-01), Shafer et al.
patent: 6700645 (2004-03-01), Shigematsu
patent: 6781766 (2004-08-01), Takahashi
patent: 6791761 (2004-09-01), Shafer et al.
patent: 6930837 (2005-08-01), Shafer et al.
patent: 2001/0050820 (2001-12-01), Shafer et al.
patent: 2002/0001141 (2002-01-01), Shafer et al.
patent: 2002/0005938 (2002-01-01), Omura
patent: 2002/0024741 (2002-02-01), Terasawa et al.
patent: 537731 (1993-04-01), None
patent: 0 816 892 (1998-01-01), None
patent: 1 061 396 (2000-12-01), None
patent: 1 111 425 (2001-06-01), None
patent: 1 235 092 (2002-08-01), None
patent: 1 237 043 (2002-09-01), None
patent: 1 245 984 (2002-10-01), None
patent: 1088192 (1967-10-01), None
patent: 10-282411 (1998-10-01), None
patent: 10-325922 (1998-12-01), None
patent: 11-006957 (1999-01-01), None
patent: 11-095095 (1999-04-01), None
patent: 11-214293 (1999-08-01), None
patent: WO 01/51979 (2001-07-01), None
patent: WO 01/65296 (2001-09-01), None
Bruning, John H. et al., “Optical Lithography—Thirty years and three orders of magnitude, The evolution of optical lithography tools”,SPIE, vol. 3049, pp. 14-27 (1997).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Very-high aperture projection objective does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Very-high aperture projection objective, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Very-high aperture projection objective will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3916373

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.