Vertical wafer heat treatment apparatus having dual load lock ch

Details Vertical wafer heat treatment apparatus having dual load lock ch Vertical wafer heat treatment apparatus having dual load lock ch

1991-07-12

1993-06-08

Chaudhuri, Olik

Metal working

Barrier layer or semiconductor device making

118719, 118 501, H01L 2130, H01L 2146, H01L 2150, C23C 1456

Patent

active

052175014

ABSTRACT:
A vertical wafer heat treatment apparatus for for forming a film on and dry etching a plurality of wafers stored in a wafer boat. The apparatus has at least first and second load lock chambers connected by a gate. Each load lock has an inert gas independently introduced therein and exhausted therefrom. The load lock chambers are vertically connected between two separate process containers. An elevator is provided in the first load lock chamber to transfer a wafer boat into and out of the first container. A transfer means is provided in the second load lock to transfer wafers into and out of a wafer boat.

REFERENCES:
patent: 4915777 (1990-04-01), Jucha et al.
patent: 4923584 (1990-05-01), Bramhall, Jr. et al.
patent: 4938691 (1990-07-01), Ohkase et al.
patent: 5015330 (1991-05-01), Okumura et al.
patent: 5067218 (1991-11-01), Williams

Affiliated with

Also associated with

Rating

Vertical wafer heat treatment apparatus having dual load lock ch does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vertical wafer heat treatment apparatus having dual load lock ch, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vertical wafer heat treatment apparatus having dual load lock ch will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1930800