Vertical wafer boat

Details Vertical wafer boat Vertical wafer boat

1998-04-15

2000-08-29

Utech, Benjamin L.

Coating apparatus

Gas or vapor deposition

118728, 118729, C23C 1600

Patent

active

061102857

ABSTRACT:
A vertical wafer boat in which a ceramic film is prevented from being peeled off and which has a long useful life is provided. Front and rear sets each consisting of two support rods 4 which are bilaterally symmetrically arranged are respectively disposed in front and rear sides between upper and lower plates 1 and 2. A number of wafer mount groove portions 3 are formed in the support rods. The plates and the support rods are made of a ceramic base material, and the surfaces are covered by a high-purity ceramic film. At least wafer mount groove portions of front right and left support rods of the front set are located in front of a center line which is perpendicular to an insertion direction of semiconductor wafers which are to be mounted on the wafer mount groove portions. Horizontal sections of the wafer mount groove portions of the support rods have a polygonal shape which does not have an acute angle of 90.degree. or less.

REFERENCES:
patent: 5507873 (1996-04-01), Ishizuka et al.
patent: 5586880 (1996-12-01), Ohsawa
patent: 5817185 (1998-10-01), Shindo et al.
patent: 5858103 (1999-01-01), Nakajima et al.

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