Vertical type semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S328000, C257S331000, C257S341000, C257S401000

Reexamination Certificate

active

10549151

ABSTRACT:
In a vertical type MOSFET device having a super junction structure, in which a N conductive type column region and a P conductive type column region are alternately aligned, regarding to a distance between a terminal end of an active region and a terminal end of a column region, the terminal end of the column region is disposed at a position, which is separated from the active region terminal end by a distance obtained by subtracting a half of a width of the N conductive type column region from a distance corresponding to a depth of the column region. Thus, an electric field concentration at a specific portion in a region facing a narrow side of the column structure is prevented so that a breakdown voltage of the vertical type MOSFET is improved.

REFERENCES:
patent: 6512268 (2003-01-01), Ueno
patent: 6639260 (2003-10-01), Suzuki et al.
patent: 6693338 (2004-02-01), Saitoh et al.
patent: 2001/0028083 (2001-10-01), Onishi et al.
patent: 2002/0171093 (2002-11-01), Onishi et al.
patent: 2003/0160262 (2003-08-01), Kitada et al.
patent: 2003/0176031 (2003-09-01), Onishi et al.
patent: 2003/0222327 (2003-12-01), Yamaguchi et al.
patent: 2004/0016959 (2004-01-01), Yamaguchi et al.
patent: A-2004-22716 (2004-01-01), None

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