X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1989-09-20
1990-12-18
Howell, Janice A.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 35, 378208, 269 73, G21K 500, B23Q 104, B25B 122
Patent
active
049791958
ABSTRACT:
A vertical stepper transfers a circuit pattern formed on a mask onto a wafer using synchrotron radiation instead of a light source. The vertical stepper includes a wafer stage for having the wafer mounted thereon in the vertical direction and a mask stage for having the mask mounted thereon in the vertical direction. The wafer stage includes a coarse X-Y stage, a transfer member, and a wafer mounting member. The wafer mounting member is provided with a fine X-Y stage. The wafer mounting member is moved in the horizontal direction between a first position mounted on the coarse X-Y stage and a second position mounted on the mask stage by the transfer member. When exposed to the synchrotron radiation, the wafer mounting member is integrated with the mask stage. After the wafer and the mask are strictly correctly positioned by the fine X-Y stage, the wafer mounting member, integrated with the mask stage, is stepped and repeat exposed by scanning in the vertical direction.
REFERENCES:
patent: 4516253 (1985-05-01), Novak
patent: 4525852 (1985-06-01), Rosenberg
patent: 4766465 (1988-08-01), Takahashi
patent: 4803712 (1989-02-01), Kembo et al.
patent: 4803713 (1989-02-01), Fujii
patent: 4823012 (1989-04-01), Kosugi
patent: 4825086 (1989-04-01), Mueller
patent: 4843563 (1989-06-01), Takahashi et al.
patent: 4849801 (1989-07-01), Shimizu
Kamada Toru
Sakata Yuji
Sekiguchi Hidenori
Tabata Fumio
Chu Kim-Kwok
Fujitsu Limited
Howell Janice A.
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