Vertical spray etch reactor and method

Details Vertical spray etch reactor and method Vertical spray etch reactor and method

1989-05-26

1990-02-27

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156642, 156656, 1566591, 156666, 156902, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

049043390

ABSTRACT:
Vertical spray etch reactor and method in which a nitric acid etching solution is sprayed onto an upright workpiece in the form of low impact, large drops to produce a gentle sheeting flow of the etching solution down the workpiece. The solution is sprayed in a generally trapezoidal pattern with the greater portion of solution being sprayed onto the upper portion of the workpiece. The etching solution is delivered to the spray nozzles by a low shear positive displacement pump. As the workpiece leaves the etch chamber, it is sprayed with a solution to remove the etching solution and dissolved copper and to adsorb gaseous by-products from the etching reaction. The rinsing solution is collected and utilized to replenish the etching solution. The workpiece receives additional rinsing in a third chamber, and gases are exhausted from the system through an exhaust vent in the third chamber. Air is introduced into the etch chamber to move the gaseous by-products toward the exhaust vent.

REFERENCES:
patent: 4017343 (1977-04-01), Haas
patent: 4371422 (1983-02-01), Eidschun
patent: 4376009 (1983-03-01), Kunz
patent: 4454003 (1984-06-01), Fishman et al.
patent: 4482425 (1984-11-01), Battey
patent: 4497687 (1985-02-01), Nelson
patent: 4545850 (1985-10-01), Nelson
patent: 4620894 (1986-11-01), Gurian et al.

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