Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-11-14
2010-02-16
Nhu, David (Department: 2895)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S068000, C257S288000, C257SE21660, C257SE21680, C257SE21661, C257SE21662
Reexamination Certificate
active
07663172
ABSTRACT:
Method and apparatus are described for a memory cell includes a substrate, a body extending vertically from the substrate, a first gate having a vertical member and a horizontal member and a second gate comprising a vertical member and a horizontal member. The first gate is disposed laterally from the body and the second gate is disposed laterally from the first gate.
REFERENCES:
patent: 4979004 (1990-12-01), Esquivel et al.
patent: 5045490 (1991-09-01), Esquivel et al.
patent: 5448663 (1995-09-01), Faulkner et al.
patent: 5468663 (1995-11-01), Bertin et al.
patent: 5633519 (1997-05-01), Yamazaki et al.
patent: 5739567 (1998-04-01), Wong
patent: 6433382 (2002-08-01), Orlowski et al.
patent: 7312490 (2007-12-01), Zheng et al.
patent: 2002/0167839 (2002-11-01), Forbes et al.
patent: 2004/0121540 (2004-06-01), Lin
patent: 2004/0197994 (2004-10-01), Hung et al.
patent: 2004/0245562 (2004-12-01), Hsiao et al.
patent: 2006/0223262 (2006-10-01), Zheng et al.
patent: 2008/0070364 (2008-03-01), Zheng et al.
patent: 2006/105461 (2006-10-01), None
Kalavade Pranav
Zheng Jun-Fei
Intel Corporation
Kacvinsky LLC
Nhu David
LandOfFree
Vertical memory device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vertical memory device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vertical memory device and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4193750