Vertical IGFET with internal gate and method for making same

Metal working – Method of mechanical manufacture – Assembling or joining

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29576E, 29576J, 29590, 29591, 148171, 148175, 148174, 148 15, 148DIG19, 148DIG123, 148DIG126, H01L 2174, H01L 2178, H01L 2180, H01L 2994

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active

045862400

ABSTRACT:
A vertical IGFET comprising a substantially planar silicon wafer with a source electrode on one major surface and a drain electrode on the opposite major surface is disclosed. An insulated gate electrode, which includes a conductive finger portion surrounded by an insulating layer, is internally disposed in the silicon wafer such that a predetermined voltage applied to the gate electrode will regulate a current flow between the source and drain electrodes. The device is fabricated utilizing an epitaxial lateral overgrowth technique for depositing monocrystalline silicon over the insulated gate which is disposed on a silicon substrate.

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