Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-12-05
1996-09-03
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118719, 432241, 414939, 414940, 414156, 414198, C23C 1600
Patent
active
055519849
ABSTRACT:
A circulation duct with a blow fan and a shutter is provided to form gas flows in a transfer chamber below a heat treatment furnace, and a dust removing filter unit is provided in a blowout port of the circulation gas passage. Three, for example, gas supply pipes with a number of blowout holes are provided on the front side of the filter unit at set heights, and a clean air source is connected to the proximal end of the air supply pipes through an opening/closing valve. Clean gas is fed into the transfer chamber from the clean air source from the start of an unloading of the wafers to the time of the dismounting of the wafers from a wafer boat with the circulation of gas flows in the circulation gas passage stopped. A filter material of the dust removing filter is PTFE, which can reduce the amount of impurities scattered from the dust removing filter that attach on the wafers.
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Leonard, Milt, Expanded Teflon Filter Helps Build Denser Faster Disk Drives, Electronic Design, May 25, 1989 V. 37 No. 11 p. 30.
Kunemund Robert
Lund Jeffrie R.
Tokyo Electron Kabushiki Kaisha
Tokyo Electron Tohoku Kabushiki Kaisha
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