Vertical heat-treatment apparatus having a wafer transfer mechan

Details Vertical heat-treatment apparatus having a wafer transfer mechan Vertical heat-treatment apparatus having a wafer transfer mechan

1990-07-11

1992-05-05

Werner, Frank E.

Material or article handling

Chamber of a type utilized for a heating function and...

Charging of chamber

414217, 4147442, 414753, 414754, 414331, 414752, 414416, 118719, 20429825, B23K 900

Patent

active

051102480

ABSTRACT:
A vertical heat-treatment apparatus is provided with a mechanism for automatically transferring semiconductor wafers from carriers to a boat for a vertical type furnace. The automatic transferring mechanism comprises a port for receiving a plurality of carriers arranged in series in an upright state, a posture change mechanism for changing the posture of wafers in the carriers from the upright state to the horizontal state, a parallel transfer mechanism for transferring the carriers on the boat to the posture change mechanism, a carrier loading/unloading mechanism for loading the carriers on a station, a wafer loading/unloading mechanism for taking out the wafers from the carriers on the station in turn and transferring the taken-out wafers to the boat in turn, and a mounting mechanism for mounting the boat in the furnace. The carrier loading/unloading mechanism and the wafer loading/unloading mechanism are mounted on a common frame and are rotated and lifted at the same time.

REFERENCES:
patent: 4744718 (1988-05-01), Kawabata
patent: 4770590 (1988-09-01), Hugues et al.
patent: 4775281 (1988-10-01), Prentakis
patent: 4790750 (1988-12-01), Bourel et al.
patent: 4802809 (1989-02-01), Bonora et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 4955775 (1990-09-01), Ohkase et al.
patent: 4962726 (1990-10-01), Matsushita et al.
patent: 4963069 (1990-10-01), Wurst et al.

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