Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-03-06
2007-03-06
Pert, Evan (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S329000, C257SE29262
Reexamination Certificate
active
10962573
ABSTRACT:
A first region11functioning as a transistor includes a drain region111, a body region112formed over the drain region111, a source region113A formed over the body region112and a trench formed through the body region112and having a gate electrode120buried therein. A source region113B is formed over the body region112extending in a second region12.
REFERENCES:
patent: 4767722 (1988-08-01), Blanchard
patent: 5034785 (1991-07-01), Blanchard
patent: 5883411 (1999-03-01), Ueda et al.
patent: 6351009 (2002-02-01), Kocon et al.
patent: 6445037 (2002-09-01), Hshieh et al.
patent: 2662217 (1997-06-01), None
patent: 11-68107 (1999-03-01), None
patent: 11-103052 (1999-04-01), None
patent: 2000-252468 (2000-09-01), None
patent: 2001-085685 (2001-03-01), None
patent: 2001-94101 (2001-04-01), None
patent: 2001-168333 (2001-06-01), None
patent: 2002-110978 (2002-04-01), None
patent: 2003-17699 (2003-01-01), None
patent: 2003-303967 (2003-10-01), None
Gunji Hiroyuki
Mizokuchi Shuji
Yamanaka Mitsuhiro
Matsushita Electric - Industrial Co., Ltd.
McDermott Will & Emery LLP
Pert Evan
LandOfFree
Vertical gate semiconductor device and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vertical gate semiconductor device and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vertical gate semiconductor device and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3778069