Vertical gate semiconductor device and method for...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S329000, C257SE29262

Reexamination Certificate

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10962573

ABSTRACT:
A first region11functioning as a transistor includes a drain region111, a body region112formed over the drain region111, a source region113A formed over the body region112and a trench formed through the body region112and having a gate electrode120buried therein. A source region113B is formed over the body region112extending in a second region12.

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patent: 2002-110978 (2002-04-01), None
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patent: 2003-303967 (2003-10-01), None

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