Vertical boat used for heat treatment of semiconductor wafer and

Details Vertical boat used for heat treatment of semiconductor wafer and Vertical boat used for heat treatment of semiconductor wafer and

1992-12-16

1994-05-31

Yuen, Henry C.

Heating

Work feeding, agitating, discharging or conveying...

Removable furnace bottom section or kiln cart

432258, 432239, F27D 312

Patent

active

053164725

ABSTRACT:
A semiconductor wafer boat used in a vertical CVD apparatus includes four columns fixed to upper and lower support plates. Each of the columns has a plurality of first grooves arranged at regular intervals in the vertical direction so as to place wafers in substantially parallel to each other, and a plurality of second grooves formed alternately with the first grooves. A plate ring is provided for each of the second grooves so as to improve the uniformity of thickness of a film to be formed on each wafer. Each ring has an outer diameter larger than that of a wafer, and an inner diameter smaller than that of the wafer. Each ring is placed such that there is a clearance for transferring each wafer between each ring and each wafer in the vertical direction.

REFERENCES:
patent: 2208734 (1940-07-01), Schreiber
patent: 3948594 (1976-04-01), Irwin, Jr.
patent: 4468259 (1984-08-01), Mimura
patent: 4504224 (1985-03-01), Hewitt
patent: 4636170 (1987-01-01), Stupka
patent: 4938691 (1990-07-01), Ohkase et al.
patent: 5131842 (1992-07-01), Miyazchi et al.

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