Vertical apparatus for heat treating a semiconductor substrate

Details Vertical apparatus for heat treating a semiconductor substrate Vertical apparatus for heat treating a semiconductor substrate

1987-08-21

1988-08-30

Warner, Steven E.

Drying and gas or vapor contact with solids

Apparatus

Houses, kilns, and containers

34 38, F26B 1900

Patent

active

047666781

ABSTRACT:
A vertical apparatus for heat treating a semiconductor apparatus which is provided with an opening at one end, wherein the opening of a reactor provided with a reaction gas inlet and outlet is fitted with a cap which is designed to be tightly fitted to or removed from the reactor opening, a boat rest is mounted on the cap, when the cap shuts the reactor opening, the reaction gas drawn off from the inlet is carried to the outside through the outlet, when the cap is removed from the reactor opening, a gas is carried from the inlet provided in the boat rest to the outlet at the predetermined rate, and the gas passing through the gas introducing passage and gas-discharging passage provided in the boat rest prevents the open air from flowing backward into the reactor opening.

REFERENCES:
patent: 4724621 (1988-02-01), Hobson et al.
Japanese Patent Disclosure (Kokai) No. 58-78423.

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