Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate
2007-07-03
2007-07-03
Kebede, Brook (Department: 2823)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
C257SE21001, C118S715000
Reexamination Certificate
active
10959269
ABSTRACT:
The present invention provides a system (100) for aligning a dispensing apparatus (110) utilized within a semiconductor deposition chamber (102). A stationary reference apparatus (106) is disposed along the bottom of the deposition chamber. A self-alignment support system (122), comprising one or more support components (124), is intercoupled between the dispensing apparatus and a deposition system exterior component (112). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface (114) thereof. A non-yielding offset component (126) is placed upon a first surface (108) of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.
REFERENCES:
patent: 4870923 (1989-10-01), Sugimoto
patent: 4987856 (1991-01-01), Hey et al.
patent: 5304248 (1994-04-01), Cheng et al.
Brady III W. James
Kebede Brook
McLarty Peter K.
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
LandOfFree
Versatile system for self-aligning deposition equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Versatile system for self-aligning deposition equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Versatile system for self-aligning deposition equipment will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3776849