Vent gas processing scheme with vacuum swing adsorption

Gas separation: processes – Solid sorption – And liquid contact

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95 95, 95142, B01D 5304, B01D 5314

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active

052598535

ABSTRACT:
An integrated process for treating a vent gas stream containing halogenated organic compounds to produce a clean vent gas with vacuum swing adsorption of the halogenated organic compounds and the recycle of a gaseous stream from the halogenated organic compound recovery section. A liquid sponge oil containing halogenated organic compounds is contacted and admixed with the evacuated effluent from the adsorption zone to prevent the accumulation of normally gaseous hydrocarbonaceous compounds.

REFERENCES:
patent: 1753067 (1930-04-01), Ray et al.
patent: 4066423 (1978-01-01), McGill et al.
patent: 4104039 (1978-08-01), Kuri et al.
patent: 4276058 (1981-06-01), Dinsmore
patent: 4305734 (1981-12-01), McGill
patent: 4331456 (1982-05-01), Schwartz et al.
patent: 4338101 (1982-07-01), Tuttle
patent: 4343629 (1982-08-01), Dinsmore et al.
patent: 4462811 (1984-07-01), Dinsmore et al.
patent: 4670028 (1987-06-01), Kennedy
patent: 4715868 (1987-12-01), Kennedy
patent: 4842621 (1989-06-01), Robbins et al.
patent: 4857084 (1989-08-01), Robbins et al.
patent: 4902310 (1990-02-01), Vara et al.
patent: 5057125 (1991-10-01), Lankton et al.
patent: 5154735 (1992-10-01), Dinsmore et al.

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