Variable temperature processes for tunable electrostatic chuck

Details Variable temperature processes for tunable electrostatic chuck Variable temperature processes for tunable electrostatic chuck

2005-07-26

2005-07-26

Vinh, Lan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S714000, C156S345520, C156S345530

Reexamination Certificate

active

06921724

ABSTRACT:
An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to maintain the temperature of the chuck at a selectable setpoint temperature. A first setpoint temperature and a second setpoint temperature are selected. The wafer is placed on the chuck and set to the first setpoint temperature. The wafer is then processed for a first period of time at the first setpoint temperature and for a second period of time at the second setpoint temperature.

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