Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-07-26
2005-07-26
Vinh, Lan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S714000, C156S345520, C156S345530
Reexamination Certificate
active
06921724
ABSTRACT:
An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the temperature control system to maintain the temperature of the chuck at a selectable setpoint temperature. A first setpoint temperature and a second setpoint temperature are selected. The wafer is placed on the chuck and set to the first setpoint temperature. The wafer is then processed for a first period of time at the first setpoint temperature and for a second period of time at the second setpoint temperature.
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Eppler Aaron
Gottscho Richard
Kamp Tom A.
Lee Chris
Lee Steve
Lam Research Corporation
Lo Thierry K.
Thelen Reid & Priest LLP
Vinh Lan
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