Variable step height control of lithographic patterning through

Details Variable step height control of lithographic patterning through Variable step height control of lithographic patterning through

1996-12-13

1998-10-13

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058210130

ABSTRACT:
A method and apparatus for forming layers of photo-sensitive materials in different thicknesses. A mask including a first area that substantially blocks light transmission and a second area having optical characteristics, which partially blocks light transmission is employed. Light is projected through the mask onto a layer of photo-sensitive material. The first area substantially blocks the light from passing through and leaves portions of the photo-sensitive material unexposed. The secondary area reduces the intensity of light passing through the mask and projected onto other portions of the photo-sensitive material. After developing the photo-sensitive material, at least two thicknesses of photo-sensitive material results. The second area may include a number of sections that vary from each other in optical characteristics such that the intensity of the light projected onto the layer of photo-sensitive material through the second area varies in steps or continuously.

REFERENCES:
patent: 4231811 (1980-11-01), Somekh et al.
patent: 4746587 (1988-05-01), Nicholas
patent: 4902899 (1990-02-01), Lin et al.
patent: 5187726 (1993-02-01), White
patent: 5343292 (1994-08-01), Brueck et al.
patent: 5356738 (1994-10-01), Inoue et al.
patent: 5447810 (1995-09-01), Chen et al.
patent: 5476738 (1995-12-01), Yuan
patent: 5543253 (1996-08-01), Park et al.
patent: 5679484 (1997-10-01), Ito et al.

Affiliated with

Also associated with

Rating

Variable step height control of lithographic patterning through does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Variable step height control of lithographic patterning through , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Variable step height control of lithographic patterning through will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-311887