Variable rate distribution gas flow reaction chamber

Details Variable rate distribution gas flow reaction chamber Variable rate distribution gas flow reaction chamber

1993-09-16

1995-10-03

Bell, Janyce

Coating processes

Coating by vapor, gas, or smoke

4272551, 4272552, 1566431, 1566461, 216 38, C23C 1600, H01L 21306

Patent

active

054550700

ABSTRACT:
A wafer processing reactor having an input manifold to enable control of a process gas flow profile over a wafer that is being processed. Both process gas relative concentrations and flow rates can be controlled, thereby enabling an increased uniformity of processing across the wafer.

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American Heritage Dictionary, pub. Houghton Mifflin, 1969 (3 pages) (no mo.).

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