Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1977-02-07
1981-07-28
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430313, 430314, 430323, 430324, 430325, 430935, G03C 500, G03C 176, G03C 186, G03C 194
Patent
active
042810574
ABSTRACT:
Resist is applied to a surface with a syringe, or other suitable dropper, equipped with a millipore filter to remove contaminants. The surface is completely flooded with resist. Resist is allowed to remain on the surface of the evaporated metal for a period of time prior to spin coating. Allowing resist to remain on the surface prior to coating produces a uniform film. For a 2 micron thick uniform resist coating, a minimum of 15 seconds is allowed prior to spinning while in the case of a 4 micron thick resist coating a much longer period is allowed.
For the application of a 2 micron film, the resist material after partial drying for approximately 15 seconds is spun at 2000 rpm for 30 seconds. In order to apply a 5 micron thick resist film, resist is spun at 2000 rpm for 30 seconds after partial drying for approximately 10 minutes.
REFERENCES:
patent: 3576722 (1971-04-01), Fennimore
"Plating", May 1969 pp. 505-510, Puffek.
Proceedings of the Second Kodak Seminar on Micro-minaturization, Apr. 4-5, 1966, pp. 36-43.
Data Release, Incidental Intelligence about Kodak Resists, pp. 8-10.
Data Release, Kodak Autopositive Resist Type 3, Kodak Pamphlet No. p-194 (1969).
Castellani Eugene E.
Croll Ian M.
Pfeiffer Aloysius T.
Romankiw Lubomyr T.
International Business Machines - Corporation
Jancin, Jr. Julius
Jones II Graham S.
Kimlin Edward C.
Wiener Bernard N.
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