Variable magnification mask for X-ray lithography

Details Variable magnification mask for X-ray lithography Variable magnification mask for X-ray lithography

1991-03-28

1992-10-13

Hannaher, Constantine

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, 378145, 378205, 378208, 2504911, 2504922, G21K 500

Patent

active

051557495

ABSTRACT:
An X-ray mask structure for X-ray lithography which can be adjusted by applied force to provide variable magnification of a pattern on the mask membrane. The applied force is provided by the heat expansion of a deformable member and the resultant stress on a support ring. A circular patterned mask membrane is supported in a ring composed, for example, of silicon or silicon-pyrex. The support ring contains a concentric aluminum ring having an embedded circular heating element. The heating element causes expansion of the aluminum ring which causes mechanical stress in the support and expansion of the mask membrane. Expansion of the mask membrane results in a corresponding magnification of the pattern thereon.

REFERENCES:
patent: 4037111 (1977-07-01), Coquin et al.
patent: 4384919 (1983-05-01), Casey
patent: 4634643 (1987-01-01), Suzuki
patent: 4887283 (1989-12-01), Hosono
patent: 4950568 (1990-08-01), Kraus
patent: 4964145 (1990-10-01), Maldonado

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