Vaporizing reactant liquids for chemical vapor deposition film p

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

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261 62, 261 66, 261DIG65, C23C 1600

Patent

active

059762624

ABSTRACT:
The disclosure relates to a vaporizer valve which accepts a carrier gas and a pressurized liquid and forms a mixture of the carrier gas and vaporized liquid. An internal cavity receives the carrier gas through a carrier aperture and the liquid through a liquid aperture, and the mixed gas and vapor are exhausted out of the cavity via a third aperture. A moveable diaphragm disposed adjacent to the liquid aperture forms a vaporization region having a pressure gradient. The liquid passing through this pressure gradient vaporizes due to expansion. By controlling the diaphragm position with a feedback control circuit responsive to a liquid flow rate monitor, the liquid flow rate may be controlled independently of the carrier gas flow rate.

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patent: 5204314 (1993-04-01), Kirlin

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