Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1995-12-19
1999-11-02
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
261 62, 261 66, 261DIG65, C23C 1600
Patent
active
059762624
ABSTRACT:
The disclosure relates to a vaporizer valve which accepts a carrier gas and a pressurized liquid and forms a mixture of the carrier gas and vaporized liquid. An internal cavity receives the carrier gas through a carrier aperture and the liquid through a liquid aperture, and the mixed gas and vapor are exhausted out of the cavity via a third aperture. A moveable diaphragm disposed adjacent to the liquid aperture forms a vaporization region having a pressure gradient. The liquid passing through this pressure gradient vaporizes due to expansion. By controlling the diaphragm position with a feedback control circuit responsive to a liquid flow rate monitor, the liquid flow rate may be controlled independently of the carrier gas flow rate.
REFERENCES:
patent: 3930908 (1976-01-01), Jolly
patent: 4232063 (1980-11-01), Rosler et al.
patent: 4579080 (1986-04-01), Martin et al.
patent: 4668365 (1987-05-01), Foster et al.
patent: 4761269 (1988-08-01), Conger et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5035200 (1991-07-01), Morilyana et al.
patent: 5203925 (1993-04-01), Shibuya
patent: 5204314 (1993-04-01), Kirlin
Sivaramakrishnan Visweswaren
White John M.
Applied Materials Inc.
Bueker Richard
LandOfFree
Vaporizing reactant liquids for chemical vapor deposition film p does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vaporizing reactant liquids for chemical vapor deposition film p, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vaporizing reactant liquids for chemical vapor deposition film p will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2129488