Vaporization apparatus and process

Details Vaporization apparatus and process Vaporization apparatus and process

1998-03-31

2000-07-04

Bueker, Richard

Gas and liquid contact apparatus

With external supply or removal of heat

Heat producer

118726, 392342, 392394, C23C 1600

Patent

active

060827149

ABSTRACT:
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.

REFERENCES:
patent: 3805425 (1974-04-01), Spoida et al.
patent: 4616122 (1986-10-01), Burian et al.
patent: 5112442 (1992-05-01), Goodson
patent: 5853678 (1998-11-01), Li et al.
patent: 5882416 (1999-03-01), Van Buskirk et al.

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