Vapor phase growth apparatus

Details Vapor phase growth apparatus Vapor phase growth apparatus

2005-03-03

2009-02-24

Cleveland, Michael (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With workpiece support

C118S730000

Reexamination Certificate

active

07494562

ABSTRACT:
A vapor phase growth apparatus has a plurality of rotation susceptors to hold the semiconductor wafer, and a disk-like revolution susceptor on which the plurality of rotation susceptors are rotatably mounted through a bearing. The plurality of rotation susceptors each are, on its periphery, provided with a pinion gear that meshes with a common gear that allows each of the plurality of rotation susceptors to rotate on its center axis. The outermost end of rotation susceptor is substantially aligned with the outermost end of revolution susceptor and the pinion gear is located directly above the bearing.

REFERENCES:
patent: 6164844 (2000-12-01), Okumura et al.
patent: 6465043 (2002-10-01), Gupta
patent: 2002/0083899 (2002-07-01), Komeno et al.
patent: 10-219447 (1998-08-01), None

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